| 摘要 |
PURPOSE: An LCD fabricating method is provided to increase the surface roughness of a metal film by BOE(buffer Oxide Etchant) chemicals to increase the contact area between the metal film and a photosensitive pattern, thereby increasing the adhesive force therebetween. CONSTITUTION: An LCD fabricating method includes the steps of forming an amorphous silicon layer(202) and a metal film(204) on a glass substrate(200) in sequence, increasing the surface roughness of the metal film, forming a first mask pattern on the metal film, forming data lines by etching the metal film primarily by using the first mask pattern, forming an active layer by etching the amorphous silicon layer by using the first mask pattern, forming a second mask pattern by etching the first mask pattern for exposing channel areas of the amorphous silicon layer, forming source/drain electrodes by secondarily etching the residual metal film by using the second mask pattern, and removing the second photosensitive pattern.
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