发明名称 |
CORROSION RESISTANT COMPONENT OF SEMICONDUCTOR PROCESSING EQUIPMENT AND METHOD OF MANUFACTURING THEREOF |
摘要 |
A corrosion resistant component of semiconductor processing equipment such as a plasma chamber includes a metal surface such as aluminum or aluminum alloy, stainless steel, or refractory metal coated with a phosphorus nickel plating and an outer ceramic coating such as alumina, silicon carbide, silicon nitride, boron carbide or aluminum nitride. The phosphorus nickel plating can be deposited by electroless plating and the ceramic coating can be deposited by thermal spraying. To promote adhesion of the ceramic coating, the phosphorus nickel plating can be subjected to a surface roughening treatment prior to depositing the ceramic coating.
|
申请公布号 |
WO0100901(A9) |
申请公布日期 |
2002.12.27 |
申请号 |
WO2000US40229 |
申请日期 |
2000.06.14 |
申请人 |
LAM RESEARCH CORPORATION;STEGER, ROBERT, J.;CHANG, CHRIS |
发明人 |
STEGER, ROBERT, J.;CHANG, CHRIS |
分类号 |
C23C18/31;C23C18/36;C23C18/50;C23C18/54;C23C28/00;(IPC1-7):C23C28/00 |
主分类号 |
C23C18/31 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|