发明名称 |
SUBSTRATE TABLE,PRODUCTION METHOD THEREFOR AND PLASMA TREATING DEVICE |
摘要 |
The susceptor(10)of a plasma treating device,or the electrostatic chuck(12)of a substrate table is formed by ceramic spraying.A ceramic spay layer(12A)is pore−sealed by methacrylic resin(12D).Resin raw material mainly containing methyl methacrylate is applied to and impregnated into the ceramic spray layer and then is cured to thereby fill pores between ceramic particles in the ceramic spray layer with methcrylic resin.Methacrylic resin raw material solution,which does not produce pores at curing,can complete perfect pore−sealing. |
申请公布号 |
WO02103780(A1) |
申请公布日期 |
2002.12.27 |
申请号 |
WO2002JP05068 |
申请日期 |
2002.05.24 |
申请人 |
TOKYO ELECTRON LIMITED;MUTO, SHINJI;TAGUCHI, CHIHIRO;OKAYAMA, NOBUYUKI |
发明人 |
MUTO, SHINJI;TAGUCHI, CHIHIRO;OKAYAMA, NOBUYUKI |
分类号 |
C23C4/02;C23C4/18;C23C28/00;H01L21/683;(IPC1-7):H01L21/68;C23C4/10 |
主分类号 |
C23C4/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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