发明名称 SUBSTRATE TABLE,PRODUCTION METHOD THEREFOR AND PLASMA TREATING DEVICE
摘要 The susceptor(10)of a plasma treating device,or the electrostatic chuck(12)of a substrate table is formed by ceramic spraying.A ceramic spay layer(12A)is pore−sealed by methacrylic resin(12D).Resin raw material mainly containing methyl methacrylate is applied to and impregnated into the ceramic spray layer and then is cured to thereby fill pores between ceramic particles in the ceramic spray layer with methcrylic resin.Methacrylic resin raw material solution,which does not produce pores at curing,can complete perfect pore−sealing.
申请公布号 WO02103780(A1) 申请公布日期 2002.12.27
申请号 WO2002JP05068 申请日期 2002.05.24
申请人 TOKYO ELECTRON LIMITED;MUTO, SHINJI;TAGUCHI, CHIHIRO;OKAYAMA, NOBUYUKI 发明人 MUTO, SHINJI;TAGUCHI, CHIHIRO;OKAYAMA, NOBUYUKI
分类号 C23C4/02;C23C4/18;C23C28/00;H01L21/683;(IPC1-7):H01L21/68;C23C4/10 主分类号 C23C4/02
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