| 摘要 |
PROBLEM TO BE SOLVED: To obtain a resist material and an insulating material each having a low dielectric constant and self-flame resistance. SOLUTION: The resist material comprises a photosensitive resin composition containing (A) a polysilane soluble in an organic solvent and having a weight average molecular weight of >=10,000, (B) a photo-radical generator and an oxidizer, (C) a silicone compound whose structure may be represented by formula (1) (where R<1> -R<6> are each a group selected from the group comprising 1-10C aliphatic hydrocarbon groups which may be substituted by halogen or a glycidyl group, 6-12C aromatic hydrocarbon groups which may be substituted by halogen and 1-8C alkoxy groups, R<1> -R<6> may be the same or different but at least two alkoxy groups are contained in one molecule, (m) and (n) are each an integer and m+n>=1) and (D) the organic solvent. |
