发明名称 |
Anti-reflective coating compositions for use with low k dielectric materials |
摘要 |
Anti-reflective compositions and methods of using those compositions with low dielectric constant materials are provided. In one embodiment, the compositions include polymers comprising recurring monomers having unreacted epoxide groups. In another embodiment, the polymers further comprise recurring monomers comprising epoxide rings reacted with a light attenuating compound so as to open the ring. The compositions can be applied to dielectric layers so as to minimize or prevent reflection during the dual damascene process while simultaneously blocking via or photoresist poisoning which commonly occurs when organic anti-reflective coatings are applied to low dielectric constant layers.
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申请公布号 |
US2002198333(A1) |
申请公布日期 |
2002.12.26 |
申请号 |
US20020174173 |
申请日期 |
2002.06.18 |
申请人 |
PULIGADDA RAMA;LAMB JAMES E.;FLAIM TONY D.;HUANG RUNHUI;SHAO XIE |
发明人 |
PULIGADDA RAMA;LAMB JAMES E.;FLAIM TONY D.;HUANG RUNHUI;SHAO XIE |
分类号 |
H01L21/312;G03F7/09;(IPC1-7):C08G59/14 |
主分类号 |
H01L21/312 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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