发明名称 METHOD AND APPARATUS FOR MANUFACTURING PROBE CARRIER
摘要 PROBLEM TO BE SOLVED: To provide the manufacturing method of a probe carrier that has extremely high uniformity in area and shape in each probe being arranged at the probe carrier, prevents the bounce-back of probe liquid impact, and reduces frequency for requiring the recovery operation of a liquid discharge apparatus when manufacturing the probe carrier using the liquid discharge apparatus. SOLUTION: In the manufacturing method of the probe carrier where each of a plurality of types of probes is arranged on the carrier, a plurality of types of probe solutions containing a probe material that can be specifically combined with a labeled substance are discharged from the liquid discharge apparatus onto the carrier. In the manufacturing method, when the probe solutions are to be discharged, the probe solutions are discharge while satisfying the conditions where the product Re.We of Reynolds number Re [no units] and wafer number We [no units] is equal to or more than 0.26×10<5> and is equal to or less than 1.10×10<5> [no units].
申请公布号 JP2002372481(A) 申请公布日期 2002.12.26
申请号 JP20020093020 申请日期 2002.03.28
申请人 CANON INC 发明人 WATANABE HIDENORI;OKAMOTO HISASHI;MIHASHI NAOTO
分类号 G01N31/22;G01N1/00;G01N33/53;G01N33/566;G01N35/10;G01N37/00;(IPC1-7):G01N1/00 主分类号 G01N31/22
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