发明名称 Method and apparatus for cleaning polishing surface of polisher
摘要 A polishing surface cleaning method and apparatus are capable of effectively removing the polishing residue from the polishing surface of a polishing table in a polisher by using a minimal amount of cleaning liquid. In the polisher, a workpiece to be polished is pressed against the polishing surface of the polishing table to polish the workpiece by relative motion between the polishing surface and the workpiece. The polishing surface cleaning apparatus uses mixing spray nozzles for mixing together a cleaning liquid and a gas and spraying the resulting fluid mixture on the polishing surface to clean it.
申请公布号 US2002197944(A1) 申请公布日期 2002.12.26
申请号 US20020196411 申请日期 2002.07.17
申请人 INOUE TATSUO;KOMATSU MITSUNORI 发明人 INOUE TATSUO;KOMATSU MITSUNORI
分类号 B24B55/06;B24B53/007;B24B55/02;H01L21/304;(IPC1-7):B24B21/18 主分类号 B24B55/06
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