发明名称 Method for making programmable resistance memory element
摘要 A programmable resistance memory element using a conductive sidewall layer as the bottom electrode. The programmable resistance memory material deposited over the top edge of the bottom electrode in a slot-like opening formed in a dielectric material. A method of making the opening using a silylated photoresist.
申请公布号 US2002197566(A1) 申请公布日期 2002.12.26
申请号 US20020072324 申请日期 2002.02.08
申请人 MAIMON JON;POMERENE ANDREW 发明人 MAIMON JON;POMERENE ANDREW
分类号 G11C16/02;H01L45/00;(IPC1-7):G03F7/00 主分类号 G11C16/02
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