发明名称 |
Interconnect structure and process for silicon optical bench |
摘要 |
A process and structure for forming an optical subassembly in an integrated circuit, comprising: defining electrically conducting lines and bonding pads in a metallization layer on a substrate; depositing a passivation layer over the metallization layer; etching the passivation layer to remove the passivation layer from each of the bonding pads and a portion of the metallization layer associated with each of the bonding pads; diffusing Cr from the lines proximate said bonding pads to prevent solder wetting down lines; bonding an optical device to one of the bonding pads; and attaching the substrate to a carrier utilizing solder bond attachment.
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申请公布号 |
US2002196996(A1) |
申请公布日期 |
2002.12.26 |
申请号 |
US20010885791 |
申请日期 |
2001.06.20 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
RAY SUDIPTA K.;COHEN MITCHELL S.;HERRON LESTER WYNN;INTERRANTE MARIO J.;LOMBARDI THOMAS E.;SHINDE SUBHASH L. |
分类号 |
G02B6/42;H01S5/02;(IPC1-7):G02B6/13 |
主分类号 |
G02B6/42 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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