SCANNING TYPE EXPOSURE DEVICE AND MANUFACTURING METHOD FOR GRATING

摘要

PROBLEM TO BE SOLVED: To solve the conventional problem in which distribution of irradiation intensity can not be controlled flexibly at an arbitrary rate of change relative to the longitudinal direction of more than one optical fibers simultaneously exposed. SOLUTION: The device is equipped with a laser beam source 1 for emitting a laser beam; an optical path scanning optical system 2 which emits through an optical path scanning in the x-axis direction the laser beam emitted by the laser beam source 1; a phase mask 4 which has in the x-axis direction a phase-modulation type transmissive diffraction grating having a prescribed period and which diffracts the incident laser beam into a plurality of optical fibers 5 through such diffraction grating; and a beam profile converting optical system 3 which is installed between the optical path scanning optical system 2 and the phase mask 4 and which emits the laser beam from the optical system 2 to the phase mask 4 by converting the laser beam into a vertically-long beam profile BP1 of an elliptical cross section having a short and a long axis in the x- and the y-axis direction respectively.