发明名称 HEAT DEVELOPABLE PHOTOSENSITIVE MATERIAL
摘要 PROBLEM TO BE SOLVED: To provide a heat developable photosensitive material which is free of creases and coating streaks in the formation of a photosensitive layer on a support and suppresses the occurrence of interference fringes after heat development. SOLUTION: In the heat developable photosensitive material having a photosensitive layer containing photosensitive silver halide and a non-photosensitive organic silver salt on a support of 100-300μm thickness, the support contains polyethylene terephthalate, the difference between the maximum value and minimum value of thickness of the support in the overall width direction is 3-6μm, and when the thickness of the support in the overall width direction is shown by a polygonal line graph, the maximum value of height forming a protrusion to a base line connecting points on the polygonal line graph corresponding to the thicknesses of both edges of the support is 3-6μm.
申请公布号 JP2002372766(A) 申请公布日期 2002.12.26
申请号 JP20010179668 申请日期 2001.06.14
申请人 FUJI PHOTO FILM CO LTD 发明人 TOHO KATSUNORI
分类号 G03C1/76;(IPC1-7):G03C1/76 主分类号 G03C1/76
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