| 摘要 |
PROBLEM TO BE SOLVED: To provide an apparatus, a program and a method for controlling exposure of optical equipment, with which high luminance removing processing optimal for removing the influence of a high luminance part can be selected corresponding to conditions. SOLUTION: A system control part 9 prepares a luminance histogram and investigates whether there are at least two high frequency blocks or not. When there is no or one high frequency block, high luminance processing '0' is performed for determining an exposure value without using the luminance data of a luminance higher than or equal to a predetermined high luminance threshold. When there are two high frequency blocks, it is judged whether these blocks are separated by a distance longer than that of the predetermined number of blocks or not and it is investigated whether a luminance value shown by a darker high frequency block is less than a certain luminance value (dark part threshold) or not. When the luminance value is small, high luminance processing '1' is performed not to execute high luminance removing processing too much. When such a situation does not correspond to any of the high luminance processing, high luminance processing '2' predetermined as most standard processing is executed.
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