发明名称 Laser irradiation apparatus
摘要 There are disposed two homogenizers for controlling an irradiation energy density in the longitudinal direction of a laser light transformed into a linear one which is inputtted into the surface to be irradiated. Also, there is disposed one homogenizer for controlling an irradiation energy density in a width direction of the linear laser light. According to this, the uniformity of laser annealing can be improved by the minimum number of homogenizers.
申请公布号 US2002196551(A1) 申请公布日期 2002.12.26
申请号 US20020226865 申请日期 2002.08.22
申请人 SEMICONDUCTOR ENERGY LABORATORY CO. LTD., A JAPANESE CORPORATION 发明人 YAMAZAKI SHUNPEI;TANAKA KOICHIRO;TERAMOTO SATOSHI
分类号 B23K26/06;B23K26/073;G02B27/09;H01S3/13;H01S5/40;(IPC1-7):G02B27/10 主分类号 B23K26/06
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