发明名称 |
Laser irradiation apparatus |
摘要 |
There are disposed two homogenizers for controlling an irradiation energy density in the longitudinal direction of a laser light transformed into a linear one which is inputtted into the surface to be irradiated. Also, there is disposed one homogenizer for controlling an irradiation energy density in a width direction of the linear laser light. According to this, the uniformity of laser annealing can be improved by the minimum number of homogenizers.
|
申请公布号 |
US2002196551(A1) |
申请公布日期 |
2002.12.26 |
申请号 |
US20020226865 |
申请日期 |
2002.08.22 |
申请人 |
SEMICONDUCTOR ENERGY LABORATORY CO. LTD., A JAPANESE CORPORATION |
发明人 |
YAMAZAKI SHUNPEI;TANAKA KOICHIRO;TERAMOTO SATOSHI |
分类号 |
B23K26/06;B23K26/073;G02B27/09;H01S3/13;H01S5/40;(IPC1-7):G02B27/10 |
主分类号 |
B23K26/06 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|