| 摘要 |
The non-water-based resist stripping liquid management apparatus according to the present invention manages in an adjusting bath a non-water-based resist stripping liquid that is used in resist stripping equipment. In this apparatus, an absorptiometer that measures the MEA concentration in the non-water-based resist stripping liquid and an analyzer that measures the degraded component concentration in the non-water-based resist stripping liquid are connected to a resist stripping treatment bath (adjusting bath) via pipelines, and at least one of a resist stripping stock liquid, an MEA stock liquid, a resist stripping reclaimed liquid, and a premixed resist stripping new liquid are fed into the resist stripping treatment bath in accordance with the measurement values obtained. As a result, the resist stripping performance of the non-water-based resist stripping liquid can be stably maintained, the amount of liquid used can be reduced, and the time for which operation is shut down can be reduced.
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