| 摘要 |
<p>PROBLEM TO BE SOLVED: To facilitate mask identification in photomasks (resist masks) of which the light shielding body patterns consist of a resist material, by which mask management can be efficiently carried out in manufacturing LSIs by using the resist masks. SOLUTION: Mask identification marks 109 contained with the information on the kinds of the masks, lot numbers, etc., by the formation of carbon material patterns by irradiation with an FIB the formation of dye material patterns by an ink jet method, or the deposition of seals previously formed with the patterns are annexed outside the arrangement regions of the resist patterns 102 on a resist mask substrate 101. The masks used for manufacture of semiconductor devices are managed by reading the mask information on the kinds of the masks, lot numbers, etc., from the identification marks 109.</p> |
