| 摘要 |
PROBLEM TO BE SOLVED: To manufacture a transparent laminate with little lowering of transmittance of visible rays in a short wavelength region, suitably used for a filter of a plasma display panel, by forming a transparent thin film of high refractive index having high transmittance of visible rays in a short wavelength region, when forming the above transparent thin film with high refractive index by sputtering, in a manufacturing process which repeatedly laminates the transparent thin film with high refractive index and a silver-based transparent conductive thin film on the surface of a transparent substrate. SOLUTION: The method for manufacturing the transparent laminate, which repeatedly laminates n units (n=1-4), where the one unit represents a set of the transparent thin film with high refractive index and the silver-based transparent conductive thin film, on the surface of the transparent substrate, and forms the transparent thin film with high refractive index thereon, is characterized by forming the transparent thin film having high refractive index with sputtering, while controlling a content of sputtering-gas-composing atoms included in the thin film at 0.05 atom.% or less.
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