| 摘要 |
In a lithographic projection apparatus, extreme ultraviolet radiation, e.g., of a wavelength of 13 nm, is generated by an undulator 10 in an electron storage ring. The radiation is collected by a first relay mirror 13, and an image of the source waist is formed at an intermediate plane. At the intermediate plane, a first scattering mirror 14 is provided to increase the divergence of the radiation beam in at least one plane. A second relay mirror 15 images the first scattering mirror onto the entrance pupil 18 of the projection system of the lithographic apparatus. A second scattering mirror 16 folds the projection beam onto the mask 17 and further increases the divergence of the radiation beam.
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