发明名称 |
SEMICONDUCTOR DEVICE, SEMICONDUCTOR MEMORY DEVICE AND MANUFACTURING METHOD, AND PORTABLE INFORMATION EQUIPMENT |
摘要 |
PROBLEM TO BE SOLVED: To provide a semiconductor device, having a channel region made of a polycrystalline semiconductor having a small off-leakage and a small unevenness of the off-leakage at each element. SOLUTION: A TFT is formed on an insulating board 1. The channel region of the TFT is made of a polycrystalline silicon. A thickness of this channel region is 5 nm or less, and the width of the channel region is 0.3 μm or less. As a result, off-leakage of the TFT can be suppressed to be very small, and the unevenness of the TFT can be suppressed. |
申请公布号 |
JP2002368226(A) |
申请公布日期 |
2002.12.20 |
申请号 |
JP20010175634 |
申请日期 |
2001.06.11 |
申请人 |
SHARP CORP |
发明人 |
IWATA HIROSHI;SHIBATA AKIHIDE;KITOU JIYUNGO |
分类号 |
G11C11/405;H01L21/8242;H01L21/8247;H01L27/10;H01L27/108;H01L29/786;H01L29/788;H01L29/792 |
主分类号 |
G11C11/405 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|