发明名称 SEMICONDUCTOR DEVICE, SEMICONDUCTOR MEMORY DEVICE AND MANUFACTURING METHOD, AND PORTABLE INFORMATION EQUIPMENT
摘要 PROBLEM TO BE SOLVED: To provide a semiconductor device, having a channel region made of a polycrystalline semiconductor having a small off-leakage and a small unevenness of the off-leakage at each element. SOLUTION: A TFT is formed on an insulating board 1. The channel region of the TFT is made of a polycrystalline silicon. A thickness of this channel region is 5 nm or less, and the width of the channel region is 0.3 μm or less. As a result, off-leakage of the TFT can be suppressed to be very small, and the unevenness of the TFT can be suppressed.
申请公布号 JP2002368226(A) 申请公布日期 2002.12.20
申请号 JP20010175634 申请日期 2001.06.11
申请人 SHARP CORP 发明人 IWATA HIROSHI;SHIBATA AKIHIDE;KITOU JIYUNGO
分类号 G11C11/405;H01L21/8242;H01L21/8247;H01L27/10;H01L27/108;H01L29/786;H01L29/788;H01L29/792 主分类号 G11C11/405
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