发明名称 METHOD AND EQUIPMENT FOR MEASURING ORGANIC MATTER ON SURFACE OF SEMICONDUCTOR SUBSTRATE
摘要 PROBLEM TO BE SOLVED: To measure the quantity of organic matters adhering onto the surface of a semiconductor substrate locally. SOLUTION: In the method for measuring the quantity of organic matters on the surface of a semiconductor substrate, surface static charges Qss generated by irradiating the surface of the semiconductor substrate with light are measured and after removing the organic matters on the surface of the semiconductor substrate 14, surface static charges Qss' on the surface of the semiconductor substrate 14 are measured similarly to the previous time. The quantity of organic matters adhering to the surface of the semiconductor substrate 14 can be determined from the difference between the Qss and Qss'. Since the Qss can be measured at a pitch of 15 mm, for example, the quantity of organic matters adhering to the surface of the semiconductor substrate can be measured locally.
申请公布号 JP2002368050(A) 申请公布日期 2002.12.20
申请号 JP20010171876 申请日期 2001.06.07
申请人 TOSHIBA CORP;TOSHIBA MICROELECTRONICS CORP 发明人 ITO AKIKO;KATANO MAKIKO;MIYASHITA MORIYA;TOYOMARU YOKO
分类号 G01N27/00;H01L21/66;(IPC1-7):H01L21/66 主分类号 G01N27/00
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