发明名称 METHOD FOR MANUFACTURING NITRIDE SEMICONDUCTOR ELEMENT
摘要 PROBLEM TO BE SOLVED: To provide a method for manufacturing a nitride semiconductor element by which the end face of a resonator of a GaN-based semiconductor laser can be stably formed. SOLUTION: This method for manufacturing a nitride semiconductor element is used for forming the end face of a resonator by dry etching. Furthermore, the end face thereof is smoothened by wet etching to form a more appropriate end face.
申请公布号 JP2002368344(A) 申请公布日期 2002.12.20
申请号 JP20010170581 申请日期 2001.06.06
申请人 MATSUSHITA ELECTRIC IND CO LTD 发明人 SUGAWARA TAKESHI;OTSUKA NOBUYUKI;BAN YUZABURO
分类号 H01L21/308;H01S5/323;H01S5/343;(IPC1-7):H01S5/343 主分类号 H01L21/308
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