发明名称 |
METHOD FOR MANUFACTURING NITRIDE SEMICONDUCTOR ELEMENT |
摘要 |
PROBLEM TO BE SOLVED: To provide a method for manufacturing a nitride semiconductor element by which the end face of a resonator of a GaN-based semiconductor laser can be stably formed. SOLUTION: This method for manufacturing a nitride semiconductor element is used for forming the end face of a resonator by dry etching. Furthermore, the end face thereof is smoothened by wet etching to form a more appropriate end face.
|
申请公布号 |
JP2002368344(A) |
申请公布日期 |
2002.12.20 |
申请号 |
JP20010170581 |
申请日期 |
2001.06.06 |
申请人 |
MATSUSHITA ELECTRIC IND CO LTD |
发明人 |
SUGAWARA TAKESHI;OTSUKA NOBUYUKI;BAN YUZABURO |
分类号 |
H01L21/308;H01S5/323;H01S5/343;(IPC1-7):H01S5/343 |
主分类号 |
H01L21/308 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|