发明名称 TREATMENT SYSTEM
摘要 PROBLEM TO BE SOLVED: To provide a treatment system that can remove not only water and gas constituents, but also reaction by-products and organic constituents without making occupation space larger. SOLUTION: The treatment system has a plurality of treatment devices 32A to 32D that carry out specific treatment to a workpiece W to be treated, a common conveyance chamber 34 that is connected to the plurality of treatment devices commonly and can be evacuated, a conveyance means 40 that is provided in the common conveyance chamber to convey the workpiece to be treated among the treatment devices, a preliminary heating area section 50 that is provided in the common conveyance chamber to allow the workpiece to be subjected to preliminary heating, and an ultraviolet irradiation area section 52 that is provided in the common conveyance chamber to irradiate the workpiece with ultraviolet rays, thus removing not only water and gas constituents, but also reaction by-products and organic constituents without making occupation space larger.
申请公布号 JP2002367976(A) 申请公布日期 2002.12.20
申请号 JP20010177736 申请日期 2001.06.12
申请人 TOKYO ELECTRON LTD 发明人 SHO JUSEN;RI KAZUNARI
分类号 C23C14/02;C23C16/02;H01L21/31;H01L21/677;H01L21/68;(IPC1-7):H01L21/31 主分类号 C23C14/02
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