| 摘要 |
PROBLEM TO BE SOLVED: To prevent foreign matter or mist from sticking to a substrate when the substrate is spun and dried after developing and rinsing. SOLUTION: A developer has a stage 2 provided with a drive unit 5 which horizontally holds and spins a substrate patterned by an aligner after application of resist; and a mist cover 10 which can be vertically moved relative to a cup 3 installed around the substrate 1. In drying after developing and rinsing, the mist cover 10 is brought close to the substrate 1 to cover the substrate. Thus, sticking of mist repelled by the cup 3 during spinning or suspending mist during spinning is prevented, and thus defect, such as residual film, due to stain is prevented from occurring. |
