发明名称 INSPECTION DEVICE AND INSPECTION METHOD FOR OPTOELECTRONIC DEVICE AND MANUFACTURING METHOD FOR THE SAME DEVICE
摘要 PROBLEM TO BE SOLVED: To perform a highly accurate inspection and a high accurate adjustment by receiving efficiently a reflected light by a liquid crystal layer in the manufacturing process of an optoelectronic device such as a reflection type liquid crystal device. SOLUTION: In this device and method, a polarized light (Li) having a prescribed state is irradiated to an electro-optic panel (10) as an illuminating light for inspection. This polarized light is reflected by the surfaces (10b) of substrates constituting the electro-optic panel and also is transmitted through the substrates and is reflected also by an electro-optic material layer (10a). These reflected rays of light (Lr) reach a separating means (26) and rays of light (L1, L2) reflected by the substrates are interrupted by the separating means (26) and the light (L3) reflected by the electro-optic material layer passes through the means 26. When the light passed through the means 26 is received, a detection signal corresponding to the light is outputted and the inspection and the adjustment are performed in this device and method.
申请公布号 JP2002366055(A) 申请公布日期 2002.12.20
申请号 JP20010177147 申请日期 2001.06.12
申请人 SEIKO EPSON CORP 发明人 IMAEDA CHIAKI;TANIOKA KENICHI
分类号 G01M11/00;G02F1/13;G02F1/13357;G09F9/00;(IPC1-7):G09F9/00;G02F1/133 主分类号 G01M11/00
代理机构 代理人
主权项
地址