发明名称 |
INSPECTION DEVICE AND INSPECTION METHOD FOR OPTOELECTRONIC DEVICE AND MANUFACTURING METHOD FOR THE SAME DEVICE |
摘要 |
PROBLEM TO BE SOLVED: To perform a highly accurate inspection and a high accurate adjustment by receiving efficiently a reflected light by a liquid crystal layer in the manufacturing process of an optoelectronic device such as a reflection type liquid crystal device. SOLUTION: In this device and method, a polarized light (Li) having a prescribed state is irradiated to an electro-optic panel (10) as an illuminating light for inspection. This polarized light is reflected by the surfaces (10b) of substrates constituting the electro-optic panel and also is transmitted through the substrates and is reflected also by an electro-optic material layer (10a). These reflected rays of light (Lr) reach a separating means (26) and rays of light (L1, L2) reflected by the substrates are interrupted by the separating means (26) and the light (L3) reflected by the electro-optic material layer passes through the means 26. When the light passed through the means 26 is received, a detection signal corresponding to the light is outputted and the inspection and the adjustment are performed in this device and method.
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申请公布号 |
JP2002366055(A) |
申请公布日期 |
2002.12.20 |
申请号 |
JP20010177147 |
申请日期 |
2001.06.12 |
申请人 |
SEIKO EPSON CORP |
发明人 |
IMAEDA CHIAKI;TANIOKA KENICHI |
分类号 |
G01M11/00;G02F1/13;G02F1/13357;G09F9/00;(IPC1-7):G09F9/00;G02F1/133 |
主分类号 |
G01M11/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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