| 摘要 |
PROBLEM TO BE SOLVED: To provide an exposure apparatus and method for exposure in a shape coincident with a desired pattern by correcting a distortion curve by an optical system and perform exposure with an irradiating intensity uniform in a space and time. SOLUTION: The exposure apparatus comprises a light source means 1 for supplying substantially parallel luminous fluxes, many infinitesimal mirrors capable of changing directions independently from each other, and a space optical modulation means 2 for reflecting the luminous fluxes from the means 1 via the many mirrors to deflect the fluxes, in such a manner that an image is formed on an article 5 to be exposed by the fluxes reflected and deflected by the means 2 and the article 4 is exposed. The apparatus comprises a photodetecting means 81 disposed near the article to be exposed, and a control means 9 for controlling directions of the mirrors of the means based on an output of the means 81.
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