METHOD FOR DESORBING SILICON AND METHOD FOR ANALYZING IMPURITIES IN SILICON WAFER

摘要

PROBLEM TO BE SOLVED: To provide a method for desorbing silicon easily with low contamination from a solution containing silicon before thrown into an analyzer without affected by impurity contamination caused by operation or the chemical itself, and a method for analyzing impurities in a silicon wafer stably with high sensitivity by enhancing analytic sensitivity through application of the method for desorbing silicon. SOLUTION: In the method for desorbing silicon from a solution containing silicon, a solution containing silicon and a desorption solution containing hydrofluoric water and nitric acid are placed in the same enclosed container and each solution is heated for a specified time thus desorbing silicon in the solution containing silicon.