ETCHING AGENT COMPOSITION FOR TRANSPARENT CONDUCTIVE FILM

摘要

PROBLEM TO BE SOLVED: To provide an etching agent that can prevent the generation of etching residues completely, and at the same time carry out etching under mild conditions when a transparent conductive film is to be etched. SOLUTION: The etching agent composition for transparent conductive films is made of solution containing sulfamic acid, polyoxyethylene alkylether sulfate, polyoxyethylene alkylphenylether sulfate, or polyoxyalkylen alkylether phosphoric acid ester.