ELECTRON BEAM EXPOSURE APPARATUS AND METHOD, AND METHOD FOR MANUFACTURING SEMICONDUCTOR ELEMENT

摘要

PROBLEM TO BE SOLVED: To provide an electronic beam exposure apparatus for detecting a fault of a buffer memory which stores exposure data of an exposure pattern data. SOLUTION: The electron beam exposure apparatus is provided for exposing a wafer to the beam. The apparatus comprises a supervision controller for supervision controlling a wafer exposure unit, a first buffer memory for temporarily holding exposure data of data of the exposure pattern to be exposed on the wafer, a second buffer memory for temporarily holding wafer exposure data a first exposure unit for irradiating a wafer with a wafer electron beam based on the wafer exposure data output from the first buffer memory, and a first comparator for comparing the wafer exposure data output from the first buffer memory with wafer exposure data output from the second buffer memory to inform a comparison result to a wafer supervision controller.