MEMBER FOR SUPPORTING SUBSTRATE, AND UNIT, METHOD AND SYSTEM FOR PROCESSING SUBSTRATE

摘要

PROBLEM TO BE SOLVED: To realize high quality processing of a substrate by suppressing the effect of a holding hand onto the substrate. SOLUTION: A hand H21 for carrying out a processed substrate from the hot plate at a prebake section is provided with suction pads P1-P4 coming into line contact with the lower surface of the substrate with a line width not wider than 2 mm, and supporting pads Ps1 and Ps2. A large quantity of heat is not exchanged between such a hand H21 and a high temperature substrate heated by means of the hot plate. Consequently, the substrate is not affected by undesired thermal effect. More specifically, undesired unevenness does not appear in the exposed and developed resist.