ELECTRON BEAM EXPOSURE SYSTEM, ELECTRON BEAM EXPOSING METHOD, AND METHOD FOR FABRICATING SEMICONDUCTOR ELEMENT

摘要

An electron beam exposure system for exposing a wafer with an electron beam, comprising a section for generally controlling a wafer exposing system, a first buffer memory for temporarily holding exposure data, i.e. data of a pattern for exposing the wafer, a second buffer memory for temporarily holding the exposure data, a first exposing section for irradiating the wafer with an electron beam based on exposure data outputted from the first buffer memory, and a first comparing section for comparing exposure data outputted from the first buffer memory with exposure data outputted from the second buffer memory and informing the comparison results to the general control section.