USE OF A GETTERING AGENT IN A CHEMICAL MECHANICAL POLISHING AND RINSING OPERATION AND APPARATUS THEREFOR

摘要

An abrasive slurry (504) that is capable of being used in a chemical mechanical polishing operation includes a plurality of abrasive particles, a matrix capable of carrying the plurality of abrasive particles, and a gettering agent (506). The gettering agent (506) has an affinity for a material removed during the chemical mechanical polishing operation. A rinsing fluid (604) that is capable of being used in a post-chemical mechanical polishing rinsing cycle includes a gettering agent (606) having an affinity for a residue material resulting from the chemical mechanical polishing operation.