| 摘要 |
Color filters of R, G and B consisting of a negative resist film are simultaneously exposed by use of a photomask intercepting light for the regions connected to the transparent pixel electrodes after the source electrodes. Then, the color filters are simultaneously developed. Since the color filters consist of a negative resist film, the regions of the color filters corresponding to the light-intercepted regions, that is, the regions connected to the transparent pixel electrodes after the source electrodes are removed by the development, so that openings are formed.
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