Fabrication of high temperature low hysterisis shape memory alloy thin film

摘要

A nickel titanium hafnium copper thin film shape memory alloy having a composition (TiHf)5-55(NiCu)45-50 comprising about 2 atomic percent to about 10 atomic percent copper and the fabrication method of said shape memory thin film by magnstron sputtering using Kr as working gas and conducting the deposition at elevated substrate temperature.