发明名称 |
NEUTRAL PARTICLE BEAM PROCESSING APPARATUS |
摘要 |
A neutral particle beam processing apparatus comprises a plasma generator for generating positive ions and/or negative ions in a plasma, a pair of electrodes (5, 6) involving the plasma generated by the plasma generator therebetween, and a power supply (102) for applying a voltage between the pair of electrodes (5, 6). The pair of electrodes (5, 6) accelerate the positive ions and/or the negative ions generated by the plasma generator. The positive ions and/or the negative ions are neutralized and converted into neutral particles while being drifted in the plasma between the pair of electrodes (5, 6) toward a workpiece (X). The accelerated neutral particles pass through one of the electrodes (6) and are applied to the workpiece (X). |
申请公布号 |
WO02078040(A3) |
申请公布日期 |
2002.12.19 |
申请号 |
WO2002JP02748 |
申请日期 |
2002.03.22 |
申请人 |
EBARA CORPORATION;ICHIKI, KATSUNORI;YAMAUCHI, KAZUO;HIYAMA, HIROKUNI;SAMUKAWA, SEIJI |
发明人 |
ICHIKI, KATSUNORI;YAMAUCHI, KAZUO;HIYAMA, HIROKUNI;SAMUKAWA, SEIJI |
分类号 |
H05H1/46;B01J19/08;C23C14/32;C23C16/50;H01J27/16;H01J37/08;H01J37/317;H01J37/32;H01L21/205;H01L21/302;H01L21/3065;H05H3/02 |
主分类号 |
H05H1/46 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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