发明名称 NEUTRAL PARTICLE BEAM PROCESSING APPARATUS
摘要 A neutral particle beam processing apparatus comprises a plasma generator for generating positive ions and/or negative ions in a plasma, a pair of electrodes (5, 6) involving the plasma generated by the plasma generator therebetween, and a power supply (102) for applying a voltage between the pair of electrodes (5, 6). The pair of electrodes (5, 6) accelerate the positive ions and/or the negative ions generated by the plasma generator. The positive ions and/or the negative ions are neutralized and converted into neutral particles while being drifted in the plasma between the pair of electrodes (5, 6) toward a workpiece (X). The accelerated neutral particles pass through one of the electrodes (6) and are applied to the workpiece (X).
申请公布号 WO02078040(A3) 申请公布日期 2002.12.19
申请号 WO2002JP02748 申请日期 2002.03.22
申请人 EBARA CORPORATION;ICHIKI, KATSUNORI;YAMAUCHI, KAZUO;HIYAMA, HIROKUNI;SAMUKAWA, SEIJI 发明人 ICHIKI, KATSUNORI;YAMAUCHI, KAZUO;HIYAMA, HIROKUNI;SAMUKAWA, SEIJI
分类号 H05H1/46;B01J19/08;C23C14/32;C23C16/50;H01J27/16;H01J37/08;H01J37/317;H01J37/32;H01L21/205;H01L21/302;H01L21/3065;H05H3/02 主分类号 H05H1/46
代理机构 代理人
主权项
地址