发明名称 Micromechanical and microoptomechanical structures with backside metalization
摘要 The present invention provides a micromechanical or microoptomechanical structure produced by a process comprising defining the structure in a single-crystal silicon layer separated by an insulator layer from a substrate layer; selectively etching the single crystal silicon layer; depositing and etching a polysilicon layer on the insulator layer, with remaining polysilicon forming mechanical elements of the structure; metalizing a backside of the structure; and releasing the formed structure.
申请公布号 US2002192852(A1) 申请公布日期 2002.12.19
申请号 US20020192087 申请日期 2002.07.09
申请人 SCHARF BRUCE R.;ZOSEL ANDREW J.;KUBBY JOEL A.;GULVIN PETER M.;LIN CHUANG-CHIA;CHEN JINGKUANG;TRAN ALEX T. 发明人 SCHARF BRUCE R.;ZOSEL ANDREW J.;KUBBY JOEL A.;GULVIN PETER M.;LIN CHUANG-CHIA;CHEN JINGKUANG;TRAN ALEX T.
分类号 B81C1/00;B81B3/00;H01L21/762;H01L27/14;(IPC1-7):H01L21/00 主分类号 B81C1/00
代理机构 代理人
主权项
地址
您可能感兴趣的专利