发明名称 |
Micromechanical and microoptomechanical structures with backside metalization |
摘要 |
The present invention provides a micromechanical or microoptomechanical structure produced by a process comprising defining the structure in a single-crystal silicon layer separated by an insulator layer from a substrate layer; selectively etching the single crystal silicon layer; depositing and etching a polysilicon layer on the insulator layer, with remaining polysilicon forming mechanical elements of the structure; metalizing a backside of the structure; and releasing the formed structure.
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申请公布号 |
US2002192852(A1) |
申请公布日期 |
2002.12.19 |
申请号 |
US20020192087 |
申请日期 |
2002.07.09 |
申请人 |
SCHARF BRUCE R.;ZOSEL ANDREW J.;KUBBY JOEL A.;GULVIN PETER M.;LIN CHUANG-CHIA;CHEN JINGKUANG;TRAN ALEX T. |
发明人 |
SCHARF BRUCE R.;ZOSEL ANDREW J.;KUBBY JOEL A.;GULVIN PETER M.;LIN CHUANG-CHIA;CHEN JINGKUANG;TRAN ALEX T. |
分类号 |
B81C1/00;B81B3/00;H01L21/762;H01L27/14;(IPC1-7):H01L21/00 |
主分类号 |
B81C1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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