发明名称 |
HIGH-DIELECTRIC CONSTANT INSULATORS FOR FEOL CAPACITORS |
摘要 |
Methods of forming front-end-of the line (FEOL) capacitors such as polysilicon-polysilicon capacitors and metal-insulator-silicon capacitors are provided that are capable of incorporating a high-dielectric constant (k of greater than about 8) into the capacitor structure. The inventive methods provide high capacitance/area devices with low series resistance of the top and bottom electrodes for high frequency responses. The inventive methods provide a significant reduction in chip size, especially in analog and mixed-signal applications where large areas of capacitance are used.
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申请公布号 |
US2002192881(A1) |
申请公布日期 |
2002.12.19 |
申请号 |
US20010882749 |
申请日期 |
2001.06.15 |
申请人 |
INTERNATIONAL BUSINESS MACHINES COPORATION |
发明人 |
BALLANTINE ARNE W.;BUCHANAN DOUGLAS A.;CARTIER EDUARD A.;COOLBAUGH DOUGLAS D.;GOUSEV EVGENI P.;OKORN-SCHMIDT HARALD F. |
分类号 |
H01L29/73;H01L21/02;H01L21/28;H01L21/331;H01L21/822;H01L21/8222;H01L21/8234;H01L21/8249;H01L27/04;H01L27/06;H01L27/08;H01L29/51;H01L29/94;(IPC1-7):H01L21/339 |
主分类号 |
H01L29/73 |
代理机构 |
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代理人 |
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地址 |
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