发明名称 |
Photosensitive polymer and chemically amplified photoresist composition containing the same |
摘要 |
The photosensitive polymer includes a first monomer which is norbornene ester having C1 to C12 aliphatic alcohol as a substituent, and a second monomer which is maleic anhydride. A chemically amplified photoresist composition, containing the photosensitive polymer, has an improved etching resistance and adhesion to underlying layer materials, and exhibits wettability to developing solutions.
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申请公布号 |
US2002193542(A1) |
申请公布日期 |
2002.12.19 |
申请号 |
US20020218637 |
申请日期 |
2002.08.15 |
申请人 |
JUNG DONG-WON;CHOI SANG-JUN;LEE SI-HYEUNG;LEE SOOK |
发明人 |
JUNG DONG-WON;CHOI SANG-JUN;LEE SI-HYEUNG;LEE SOOK |
分类号 |
C08F220/18;C08F222/06;C08F232/04;G03F7/004;G03F7/039;H01L21/027;(IPC1-7):C08F36/00 |
主分类号 |
C08F220/18 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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