发明名称 |
Photosensitive material processing device |
摘要 |
In a shutter facing an aperture portion in a partition plate in a photosensitive material processing device, a blocking member, formed substantially in a semicircular cylindrical shape, is placed by the rotation of a shaft between blades thereby closing the aperture portion. The opening between the blades is opened by rotating the blocking member integrally with the shaft so that a photosensitive material can pass through. Multi-leveled surfaces are formed on the top surface of a guide plate. Aperture portions for mounting rollers with adaptors are formed in an alternating pattern on the surfaces. A plurality of protruding guide ribs are provided extending across the surfaces. A plurality of brush roller parameters are adjusted so that a winding mark index defined by the parameters falls within a predetermined range. Rollers are washed when a finisher control system is restarted after an unforeseen long stoppage.
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申请公布号 |
US2002191976(A1) |
申请公布日期 |
2002.12.19 |
申请号 |
US20020177106 |
申请日期 |
2002.06.24 |
申请人 |
FUJI PHOTO FILM CO., LTD. |
发明人 |
NOZAWA RYOEI;SUYA TOSHIHIRO;YAMAMOTO HIDETO;IWAMOTO TAKAYUKI;MATSUDA SHINICHI |
分类号 |
G03D3/13;(IPC1-7):G03D3/08 |
主分类号 |
G03D3/13 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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