| 摘要 |
A disclosed exposure apparatus has a projection optical system, an illumination system including a light source and adapted to send exposure illumination light to the projection optical system, and a substrate stage for supporting a sensitive substrate so that the sensitive substrate is exposed by the illumination light passed through the projection optical system. A shot area of the illumination light is formed on a plane corresponding to a top surface of the sensitive substrate. The apparatus comprises a photo-electric sensor having a light receiving portion supported by the substrate stage for a shifting movement within the shot area along the plane, a blind disposed between the light source and the projection optical system and adapted to shield the illumination light reaching the shot area excluding an area surrounding the light receiving portion while the light receiving portion is being shifted along the plane, and a control system for obtaining an optical feature of the exposure apparatus on the basis of a signal from the photo-electric sensor. The blind is controlled by the control system so that, when the light receiving portion is shifted from one detection position to a next detection portion, before the light receiving portion reaches the next detection portion, the shielding of the illumination light at the next detection portion is released.
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