| 摘要 |
<p>A vacuum plasma processor includes a voltage-current detector (32) connected between a matching network (30) and a reactive impedance for exciting gas in a chamber (10) to a plasma for processing a workpiece (15). A constant non-zero RF parameter is maintained in a connection between an electrode (14) in the chamber and ground. The electrode and connection to ground are such that no RF energizing source is directly coupled with the electrode.</p> |
