APPARATUS AND METHODS FOR MODELING PROCESS EFFECTS AND IMAGING EFFECTS IN SCANNING ELECTRON MICROSCOPY

摘要

Disclosed are methods and apparatus for generating a test recipe for a metrology tool (306) is disclosed. A plurality of first reference images (308) that are designed to be used to fabricated a plurality of structures on a sample are provided. Each structure is imageable to form a plurality of target image patterns. A test recipe for use by a metrology tool (306) in locating the structures on the samples is generated or modified. Generating or modifying the test recipe includes forming a plurality of second reference images (310) from the first reference images (308) and associating the second reference images (310) with the test recipe. The second reference images (310) are formed to at least partially simulate one or more process effect(s) associated with fabricating the structures of the sample. Additionally, the second reference images (310) may also be formed to simulate one or more imaging effects.