发明名称 SPUTTERING DEVICE
摘要 PROBLEM TO BE SOLVED: To efficiently sputter a target while suppressing the vibration of the rotating body. SOLUTION: A target 22 is disposed facing a substrate in a vacuum chamber 12, a rotating body 30 is disposed outside a vacuum vessel 10 facing a substrate 20 across the target 22, an inner magnet 52 and an outer magnet 54 are fixed to the rotating body 30 via a yoke 50, and non-magnetic bodies 56 and 58 are fixed, leakage magnetic field is formed on the surface of the target 22 by the magnets 52 and 54, electrons are confined in this magnetic field to sputter the target 22. The entire center of gravity of the inner magnet 52, the outer magnet 54, and the non-magnetic bodies 56 and 58 is positioned so as to be the center of rotation of the rotating body 30, and generation of the vibration is suppressed when the rotating body 30 is rotated.
申请公布号 JP2002363741(A) 申请公布日期 2002.12.18
申请号 JP20010168524 申请日期 2001.06.04
申请人 HITACHI LTD 发明人 MITSUFUJI KEIMEI;OISHI SEITARO;UMEHARA SATOSHI;FUJISAWA TATSUYA;NISHIOKA KOICHI
分类号 C23C14/35;G11B5/31;(IPC1-7):C23C14/35 主分类号 C23C14/35
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