| 摘要 |
PURPOSE: A heating part of chemical vapor deposition apparatus is provided which increases connection area between connection terminal of a ground line and connection part of a heater so that residual current is smoothly discharged. CONSTITUTION: In a heating part(200) of chemical vapor deposition apparatus comprising a heater(210) having first, second and third connection parts(211,212,213) and supplying heat to a wafer holder(10); a power supply part(220) that is electrically connected to the heater(210); a loaded line(240) and a neutral line(250) for electrically connecting the first and second connection parts(211,212) to the power supply part(220); a ground line(260) having first and second connection terminals(261,262) that are inserted into a ground part(270) formed on the body of a chamber and the third connection part(213); and a protection part(230) for sealing the first, second and third connection parts(211,212,213), the heating part(200) of the chemical vapor deposition apparatus is characterized in that the third connection part(213) is a female type socket on which screw thread is formed, and the first connection terminal(261) is a male type screw on which screw thread corresponding to the third connection part is formed, and wherein the ground part(270) is a female type socket on which screw thread is formed, and the second connection terminal(262) is a male type screw on which screw thread is formed so that the second connection terminal(262) corresponds to the ground part(270).
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