| 摘要 |
PROBLEM TO BE SOLVED: To provide a radiation sensitive resin composition having high sensitivity, high resolution and high radiation transmittance, excellent in smoothness of a pattern surface in micro dimensions and capable of avoiding partial insolubilization in over-exposure without impairing basic solid state properties as a resist such as pattern shape, dry etching resistance and heat resistance. SOLUTION: The radiation sensitive resin composition is characterized in containing (A) an adamantane derivative typified by a t-butyl adamantanecarboxylate or a di(t-butoxycarbonylmethyl) adamantanedicarboxylate, (B) an alkali-insoluble or slightly alkali-soluble resin having a hydroxystyrene repeating unit and a repeating unit having an acid dissociable group and (C) a radiation sensitive acid generator. |
