DIVIDED SEQUENTIAL PROXIMITY EXPOSURE DEVICE

摘要

PROBLEM TO BE SOLVED: To subject a substrate of a determined size to a step exposure with high accuracy and high throughput in a multiple mask pattern exposure of a flat panel display. SOLUTION: This divided sequential proximity exposure device is constituted to expose and transfer mask patterns P of a mask M smaller than a substrate W onto the substrate W for every step by regulating the number of step times of a stage feed mechanism 7 to >=2 times. The device is provided with irradiation region switching means 200A which sets the size of the mask M held at the mask stage 1 and the number of the step times in accordance with the permissible amount of bending of the mask M, the size of the pattern region of the mask M and the relation between the exposure illuminance at which the tact time is short and the necessary pattern accuracy is obtainable and the sensitivity of the resist and in which irradiating means 3 for irradiating the substrate W with the light for pattern exposure is capable of switching the irradiation region in the step direction of the light for exposure according to the exposure conditions at the set number of the step times.