APPARATUS OF FORMING MASK PATTERN, APPARATUS AND METHOD OF MANUFACTURING HIGH-RESOLUTION MASK AS WELL AS METHOD OF FORMING RESIST PATTERN

摘要

PROBLEM TO BE SOLVED: To provide an apparatus of forming mask patterns which is capable of improving pattern shape controllability and transfer position accuracy by preventing the occurrence of deviations in phase differences and the reduction in the depth of focus and the allowance of the exposure energy in exposure in consequence of the nonuniformity in the pattern shapes and pattern density of the mask patterns in forming a high-resolution mask, an apparatus and method of manufacturing the high-resolution pattern as well as a method of forming resist patterns. SOLUTION: This apparatus is provided with a first mask pattern forming section 21 which forms the initial mask pattern in accordance with prescribed pattern data, a pattern dividing section 22 which divides the initial mask pattern to plural kinds of the mask patterns on the basis of the pattern shape and pattern density of the fine patterns in accordance with the data relating to a loading effect with respect to the initial mask pattern and a second mask pattern forming section 24 which forms the plural final mask patterns by each of plural kinds of the mask patterns.