TRANSPARENT CONDUCTIVE FILM MANUFACTURING METHOD, AND TRANSPARENT SUBSTRATE HAVING TRANSPARENT CONDUCTIVE FILM

摘要

PROBLEM TO BE SOLVED: To provide a transparent conductive zinc oxide film manufacturing method in which the properties of the obtained film is stable without controlling water content residual in a film deposition tank of a sputtering apparatus, and to provide a transparent substrate having a transparent conductive film with transmissive tone less in light absorption at the wavelengths of 370-450 nm and suitable for display applications. SOLUTION: In the transparent conductive film manufacturing method for depositing the transparent conductive film on a base material by a sputtering method by using a zinc oxide target containing gallium, the zinc oxide target containing gallium of 0.1-10 mass % in terms of Ga2 O3 to the total quantity of the target is used for the target, and the sputtering atmosphere comprises gaseous hydrogen and inert gas. The transparent substrate having the transparent conductive film is characterized by that the transmissivity at the wavelength of 550 nm is >=80%, and the transmissivity (the mean value) at the wavelength of 370-450 nm is >=75%.