ION IMPLANT APPARATUS FOR FABRICATING SEMICONDUCTOR DEVICE

摘要

PURPOSE: An ion implant apparatus for fabricating a semiconductor device is provided to align easily a position of a sensor for sensing height of a plate by using an installing member for grasping the sensor and controlling a position of the sensor. CONSTITUTION: An ion supply portion(110) is connected with an ion implant room(100). A plate(120) for grasping a semiconductor substrate(W) is installed in the inside of the ion implant room(100). A gradient control member(130) is formed at a lower part of the plate(120). A driving shaft(140) is used for supporting the plate(120). A driving member(150) is installed at a lower part of the driving shaft(140). A door(160) is installed at one side of the ion implant room(100). A plurality of lift pins are installed on an upper surface of the plate(120). The height of the plate(120) is controlled by moving the driving shaft(140) to an upper or a lower direction. A sensor(170) is installed at one end portion of the driving shaft(140). An installing member(180) is installed at the driving shaft(140) in order to install the sensor(170).