| 摘要 |
PROBLEM TO BE SOLVED: To provide a dry film resist that diminishes flocculate in development, can be exposed by irradiation with UV and can be developed with an alkaline aqueous solution. SOLUTION: The dry film resist is obtained by forming a layer of a photopolymerizable resin composition containing (a) 20-90 mass% thermoplastic polymer containing an α,β-unsaturated carboxyl-containing monomer as a copolymerizable component and having an acid equivalent of 100-600 and a weight average molecular weight of 20,000-500,000, (b) 5-75 mass% addition polymerizable monomer having at least two terminal ethylenically unsaturated groups, (c) 0.01-30 mass% photopolymerization initiator and (d) 0.01-30 mass% compound of the formula R1 -O-(A-O)n1 -H on a support layer. |
