| 摘要 |
PROBLEM TO BE SOLVED: To stably and effectively prevent separation of a film deposition material deposited during a film deposition step when depositing a thin film with high internal stress in a vacuum film deposition apparatus, and to suppress degradation of the productivity and increase in the film deposition cost when the apparatus is cleaned and parts are changed. SOLUTION: In the parts of the vacuum film deposition apparatus, a thin film formed of a single metal element selected from Ti, Zr, Hf, Nb, Ta, W, Ru, Pd, Ir, Pt, Ag, Au and In, or an alloy or a compound containing these metals is deposited. The part 1 of the apparatus comprises a component body 2, and a thermal sprayed film 3 deposited on the surface of the component body 2 and formed of a Cu alloy (containing 65-95 mass % Cu) containing at least one kind of the elements selected from Al, Ti, Zr, Nb, Ta, Cr, Mo, W, Mn, Fe, Co, Ni, Pt, Ag, Zn and Sn. The Cu alloy thermal sprayed film 3 has the hardness of <=Hv 200 in Vickers hardness.
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