发明名称 |
Method for improving the quality of a metal layer deposited from a plating bath |
摘要 |
The present invention is related to a method for depositing a metal-containing film from a metal plating bath, comprising the steps of subsequently depositing a metal-containing layer from a metal plating bath followed by a heating step and/or a vacuum step, said subsequent steps being repeated for a number of times in different sequences.
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申请公布号 |
US6495453(B1) |
申请公布日期 |
2002.12.17 |
申请号 |
US20000599133 |
申请日期 |
2000.06.22 |
申请人 |
INTERUNIVERSITAIR MICROELECTRONICA CENTRUM |
发明人 |
BRONGERSMA SYWERT H.;RICHARD EMMANUEL;VERVOORT IWAN;MAEX KAREN |
分类号 |
H01L21/288;H01L21/768;(IPC1-7):H01L21/44 |
主分类号 |
H01L21/288 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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